New research paper titled “Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?,” from researchers at Fraunhofer-Institut für Integrierte Systeme und ...
With this one-of-kind tool, we can now fully characterize the phase shift properties of EUV masks and materials.” — Dr. Patrick Naulleau MARTINEZ, CALIFORNIA ...
HSINCHU, Taiwan — Foundry chipmaker United Microelectronics Corp. said Thursday (December 4, 2003) that it has begun using chrome-less phase-shift masks within its 90-nm manufacturing process. UMC is ...
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