Applied Materials, Inc. introduces its new iSprint(TM) Centura(R) system, the industry's only integrated 300mm ALD/CVD (Atomic Layer Deposition / Chemical Vapor Deposition) system for sub-90nm ...
Area-selective atomic layer deposition (AS-ALD) has attracted a great deal of attention in recent years for self-aligned accurate pattern placement with subnanometer thickness control. The authors ...
Applied Materials has developed an atomic layer deposition (ALD) chamber for the deposition of thin, metal or dielectric high-purity films at low temperatures. The company has used its ALD technology, ...
ALD has been used to tackle limitations like flowability, alloy type and oxidation resistance and demonstrations have exhibited stronger final parts, enhanced processing capabilities and lower costs.
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