“Mask repair is an essential step in the manufacturing process of extreme ultraviolet (EUV) masks. Its key challenge is to continuously improve resolution and control to enable the repair of the ...
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Intel expands production of photomasks in California: EUV and High-NA EUV in the focal point
Intel begins expansion of its Bowers Campus in Santa Clara to produce more photomasks in-house.
PLAINVIEW, N.Y., Feb. 10, 2022 (GLOBE NEWSWIRE) -- Veeco Instruments Inc. (NASDAQ: VECO) today announced that a mask blank supplier to the semiconductor industry has ordered Veeco’s IBD-LDD® Ion Beam ...
(MENAFN- EIN Presswire) EINPresswire/ -- Prof. Shiyuan Liu's team from Huazhong University of Science and Technology has reported a full-chip EUV curvilinear mask optimization framework that ...
Fujimura: Let’s talk about pellicles, a topic we’ve been exploring in the survey the past couple of years. Pellicles are protective membranes that shield photomasks from contaminants and defects ...
TOKYO, Sept. 09, 2025 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered ...
Belgium-based semiconductor research institute Imec will present its latest achievements that enable high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography at the 2024 Advanced ...
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...
Lasertec, the sole provider of EUV patterned mask inspection systems, aims for double-digit revenue growth despite a slowdown in sales from China due to US export restrictions. The company has also ...
2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...
Although Hoya is widely known as an eyeglass lens and contact lens provider, it has more than 60% market share in mask blanks for semiconductor manufacturing, and an even higher market share, at more ...
Motorola Inc. today said its researchers have fabricated the first extreme ultra violet (EUV) photomasks for manufacturing sub-micron ICs with feature sizes below 100nm. The photomasks were built with ...
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